| Sl. No. | Facility | Description |
|---|---|---|
| 1 | DC/RF Magnetron sputtering unit | Preparation of metal films, Oxide Materials by Reactive Sputtering, Preparation of Oxide thin films (Semiconductors, superconductors, insulators and ceramics). Substrate temperature RT to 800 degree C and Oxygen reactive sputtering,RF Power 100W to 600W Rotary pump,Diffusion pump,Digital pirani gauge,Digital penning Gauge,2 Inch magnetron Sputtering target holder,Substrate heater with Controller,RF Power supply,DC power supply, Matching network,Argon & Oxygen gases with regulator |
| 2 | Microwave Owen | Synthesis of nano materials,Model-MC2149BB,Type-Convection,Capacity-21 Lt,Temperature-220 degree C,Cavity: stainless steel,Control type-Keypad |
| 3 | Magnetic Stirrer with hot plate | Preparation of nanomaterials by Sol-Gel method, Preparation of thin films by chemical bath deposition. Make:REMI,Model 1MLH |
| 4 | Digital Balance | Accurate weighing of samples. Model-AY220,Accuracy- 0.1mg,Pan size-80mm,Capacity-220GM |
| 5 | Ultrasonic cleaner | Substrate cleaning. Make:Equitron,Capacity-2.5 Lt,Frequency-42KHz,Power-170W |
Designed by KRP | Maintained by Research and Development Cell